Double-door vapor deposition coalescing device "MDP2015"
Supports large substrates! Simple & high-tact is a resin-based substrate film deposition system focused on productivity!
The "MDP2015" is a device that forms a metal film, such as aluminum, on a resin substrate using a resistance heating vapor deposition method, and then applies a polymer protective film through plasma polymerization to prevent corrosion. By providing two doors that open to the left and right, it allows for efficient exchange of workpieces and attachment of evaporated materials during the process. Optimization of the device configuration achieves high productivity and low running costs. 【Process Overview】 ■ Attach the workpiece, close the door, and evacuate. ■ Pre-treat the substrate surface using plasma discharge. ■ Deposit aluminum on the substrate surface using the resistance heating vapor deposition method. ■ Protect the aluminum film with a film formed by plasma polymerization of HMDSO. ■ Utilize the film formation time to exchange the workpiece on the waiting door. ■ After atmospheric release, open the door and close the waiting door to start processing. ● For more details, please download the catalog or contact us.
- Company：メープル
- Price：Other
